| Lloyd R. Harriott | | Chair, Electrical and Computer Engineering | | Professor, Virginia Microelectronics Consortium | | Ph.D., Binghamton | | | | Dr. Harriott joined Bell Laboratories in 1980 and was part of the team that developed the EBES4 field emission electron beam lithography system for mask and wafer lithography. From 1983 to 1990 he developed fundamental technology and applications for focused ion beams, including defect repair and circuit diagnosis. His research covered liquid metal ion sources, ion-solid interactions, beam-induced chemistry for deposition and etching. He received the Bell Labs Distinguished Member of technical staff award in 1987. Further research developed an all-vacuum lithography process combining molecular beam epitaxy, low-damage dry etching, and focused ion beam patterning for development of laser and quantum structures in InP materials. He became a technical manager in the advanced lithography research department in 1993. He became director of the department in 1996 with responsibility
for advanced optical and next-generation lithographies. The work in his department included advanced optical lithography, including DUV at 248 nm and 193 nm as well as resolution
enhancement technologies such as phase shift masks and optical proximity
correction and early work in EUV lithography. He was program manager of the SCALPEL projection electron beam lithography program at Bell Labs and Lucent Technologies. He has published over 120 technical papers,
two book chapters and holds eight U.S. patents. He has served on program committees and chaired several
international conferences in the field of lithography as well as serving on
several industry committees, including the SIA Lithography Technical Working
Group. He joined the Electrical and Computer Engineering department at the University of Virginia in January 2001 and promoted to department chair in January 2004 | | | | Research Interests | | Professor Harriott’s main areas of interest are in microelectronics and nanotechnology. In particular, his specialty is lithography and related micro- and nano-fabrication techniques. His recent work has included projection electron beam lithography for next-generation integrated circuits. His recent interests include molecular electronics for future generation devices. | | |
Sponsored Research
SCALPEL projection electron beam lithography (funded by: Sematech and DARPA)
Improving overlay in lithography using a deformable mask holder (funded by: DARPA)
|
|
